Abstract: Precise patterning of micro-nano-scale photosensitive materials is crucial for the preparation of Metal-Semiconductor-Metal (MSM) type UV photodetectors and the integration of photodetector ...

Graduate School of Chemical Science and Engineering, Hokkaido University, N13W8 Kita, Sapporo, Hokkaido 060-8628, Japan Graduate School of Chemical Science and Engineering, Hokkaido University, N13W8 ...

They proposed a three-dimensional vertically integrated device architecture with an AlGaN-based DUV micro-LED array and zinc ...

Emission Peak,Localized Surface Plasmon,Localized Surface Plasmon Resonance,Mica Substrate,Response Of The Device,Responsivity Of The Photodetector,Schottky Barrier,Surface Plasmon,Ultraviolet ...